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ROA:1378
Title:Comparing positional licensing patterns in HG and OT
Authors: Eric Bakovic, Anna Mai
Comment:To appear, Supplemental Proceedings of AMP 2020
Length:10
Abstract:Positional licensing refers to the observation that elements (e.g. particular feature values or feature value combinations) can be limited to specific positions (e.g. syllable onsets, initial syllables, stressed syllables, etc.). Positional licensing patterns have been analyzed using either positional markedness or positional faithfulness constraints in OT and HG. In this paper we demonstrate that the predictions of OT and HG diverge in deep but structured ways once there are more than two licensing positions. We propose an account for this structured divergence based on 3-position systems, and confirm the validity of that account with an analysis of 4-position systems. We also describe how conjoined constraints impact positional licensing patterns, and in doing so provide a counter-example to a claim made in our previous work (Mai & Bakovic 2020).
Type:Paper/tech report
Area/Keywords:Optimality Theory, Harmonic Grammar, positional licensing, cumulative interaction
Article:Version 1